Department of Physics, Science Faculty, Damascus University, Syria.
10.7508/ijnd.2014.04.014
Abstract
Porous silicon samples were prepared by electrochemical etching method for different etching times. The structural properties of porous silicon (PS) samples were determined from the Atomic Force Microscopy (AFM) measurements. The surface mean root square roughness (σ rms) changes as function of porosity were studied, and the influence of etching time on porosity and roughness was studied too. UV-Vis-NIR Spectrophotometer with integrating sphere accessory used to measure the specular reflectance (Rspec) and scattered light (Dsca) for all samples. Changes of scattered light intensity with σ rms were studied. Theoretical and measured values were compared and they were almost the same.
Alfeel, F., Awad, F., Alghoraibi, I., Qamar, F. (2014). Change of diffused and scattered light with surface roughness of p-type porous Silicon. International Journal of Nano Dimension, 5(Issue 4), 415-419. doi: 10.7508/ijnd.2014.04.014
MLA
F. Alfeel; F. Awad; I. Alghoraibi; F. Qamar. "Change of diffused and scattered light with surface roughness of p-type porous Silicon". International Journal of Nano Dimension, 5, Issue 4, 2014, 415-419. doi: 10.7508/ijnd.2014.04.014
HARVARD
Alfeel, F., Awad, F., Alghoraibi, I., Qamar, F. (2014). 'Change of diffused and scattered light with surface roughness of p-type porous Silicon', International Journal of Nano Dimension, 5(Issue 4), pp. 415-419. doi: 10.7508/ijnd.2014.04.014
VANCOUVER
Alfeel, F., Awad, F., Alghoraibi, I., Qamar, F. Change of diffused and scattered light with surface roughness of p-type porous Silicon. International Journal of Nano Dimension, 2014; 5(Issue 4): 415-419. doi: 10.7508/ijnd.2014.04.014
)